OPO/OPA Crystal
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隐藏域元素占位
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- Commodity name: OPO/OPA Crystal
Our optical parametric (OPO/OPA) MgO:PPLN crystals can be widely used for optical parametric oscillation or amplification of laser wavelengths. The period can be designed according to the required wavelength and operating temperature, allowing use between 25-200°C. It can be used in both intracavity and extracavity applications. Typically, a 1064nm pump laser is used, which can generate both the signal beam and any idler beam with a wavelength longer than the pump laser.
Our optical parametric (OPO/OPA) MgO:PPLN crystals can be widely used for optical parametric oscillation or amplification of laser wavelengths. The period can be designed according to the required wavelength and operating temperature, allowing use between 25-200°C. It can be used in both intracavity and extracavity applications. Typically, a 1064nm pump laser is used, which can generate both the signal beam and any idler beam with a wavelength longer than the pump laser.
Advantage:

- Common methods for generating mid-infrared lasers
- High-efficiency parametric oscillation/amplification
- Selectable aperture from 0.5mm to 4.0mm
- Good duty cycle and uniformity
- Good power stability
- Capable of acquiring any new wavelength within the transmission range
- High cost-performance ratio
- Strict quality control
- Optical-grade polishing and high damage threshold film
Application:
- Mid-infrared spectroscopy
- Environmental monitoring
- Laser radar and laser counters
- Optoelectronic countermeasures
- Infrared communication
- Frequency comb
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Technical parameters
Cycle (μm)
Standard/Custom(4um~35µm)
Operating temperature
25℃~200℃
Size(mm3)
Standard/Custom
Duty cycle
48%-52% /Customization
Flatness
λ/6@633nm
Parallelism
±5”
Verticality
±20”
Cleanliness
20/10
Membrane system
AR/HR
Ruike Crystal Technology possesses a well-established international platform for the R&D and manufacturing of polarized crystal processes, along with internationally advanced periodic structure design and polarization control technologies. Our services include professional periodic design, efficient and rapid mass production of polarized crystals, and high-precision temperature control equipment and lens configuration to meet your target laser system applications.
Our customized service process includes: negotiated design of domain structure grating layout, template design, wafer polarization, dicing, polishing, and coating.
Our manufactured crystals can be used for compact intracavity parametric oscillations (IPOs) or for fabricating long, large-aperture extracavity IPOs, widely used in various mid-infrared laser outputs.
Customized products:
1) Custom Design of Symmetrical Periodic Crystals:
* Polarized periodic crystals for custom AR films
* Polarized periodic crystals with larger apertures
* Crystals with non-standard lengths and custom aperture angles
2) Custom Design of Asymmetric Periodic Crystals:* Linear periodic chirped structures
* Nonlinear periodic chirped structures
Please contact our design team to discuss your customization needs.
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Series
Enter
(nm)
Output
(nm)
Cycle
(µm)
length
(mm)
Width * Thickness
(mm^2)
Membrane parameters
CTLOPO-single
1064
1.4~1.7
2.7~4.3
280,29.0,29.4,29.5,30.0,
30.3,30.4,30.6,31.2,31.8,
32.2,32.6,32.7,33.0
1-50
1.0*4.0
2.0*4.0
@1064nm/1.55um/2.7~4.3um AR (R≤1%)
CTLOPO-Multi
1064
1.4~1.7
2.7~4.3
27.6-31.6(0.3um)
1-50
1.0*10.0
@1064nm/1.55um/2.7~4.3um AR (R≤1%)
CTLOPO-Multi
1064
1.4~1.7
2.7~4.3
28.5-32.0(0.5um)
1-50
1.0*10.0
@1064nm/1.55um/2.7~4.3um AR(R≤1%)
CTLOPO-Fanout
1064
1.4~1.7
3.0~4.329.0~30.0
1-50
1.0*6.0
@1064nm/1.55um/2.9~4.0um AR (R≤1%)
CTLOPO-Fanout
1064
1.4~1.7
2.7~3.1
32.5~33.5
1-50
1.0*6.0
@1064nm/1.55um/2.7~3.5um AR (R≤1%)
CTLOPO-Fanout
1064
1.4~1.7
2.7~3.1
28.0-31.0
1-50
1.0*6.0
@1064nm/1.55um/2.7~3.5um AR (R≤1%)
CTLOPO-Fanout
1064
1.4~1.7
2.7~3.1
30.0-34.0
0.3-5
1.0*9.3
@1064nm/1.55um/2.7~3.5um AR (R≤1%)
CTLOPO-Fanout
1064
1.4~1.7
2.7~3.1
29.5-30.5
0.3-20
1.0*9.3
@1064nm/1.55um/2.7~3.5um AR (R≤1%)
CTLOPO-Cascade
1064
1.4~1.7
2.7~3.1
30.3+31.4-32.4fan-out
1-50
1.0*6.0
@1064nm/1.55um/2.7~3.5um AR (R≤1%)
Note: For customized products, please refer to the technical specifications and discuss the solution with our engineers.
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